VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE

VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE

A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.

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Hauptverfasser: Rémy BONNEMANN, Sergio PACE, Eric SILBERBERG
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Sprache:eng
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creator Rémy BONNEMANN
Sergio PACE
Eric SILBERBERG
description A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.
format Patent
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title VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
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