VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates. |
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