Systems and processes for use in treating subsurface formations

A heating system for a subsurface formation is described. The heating system includes a first heater, a second heater, and a third heater placed in an opening in the subsurface formation. Each heater includes: an electrical conductor; an insulation layer at least partially surrounding the electrical...

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Hauptverfasser: DEEG, WOLFGANG, ROES, AUGUSTINUS, VINEGAR, HAROLD J, SCHOEBER, WILLEM JAN ANTOON HENRI, WATKINS, RONNIE WADE, DEL PAGGIO, ALAN ANTHONY, FOWLER, THOMAS DAVID, COWAN, KENNETH MICHAEL, FAIRBANKS, MICHAEL DAVID, HAMILTON, PAUL TAYLOR, MCKINZIE, BILLY JOHN, MASON, STANLEY LEROY, KELTNER, THOMAS JOSEPH, WONG, SAU-WAI, WILHELMUS MARIA, HSU, CHIA-FU, NAIR, VIJAY, HIRSHBLOND, STEPHEN PALMER, STEGEMEIER, GEORGE LEO, JOHN, RANDY CARL, SANDBERG, CHESTER LEDLIE, MENOTTI, JAMES LOUIS, LAMBIRTH, GENE RICHARD, DIAZ, ZAIDA, HARRIS, CHRISTOPHER KELVIN, GRIFFIN, PETER TERRY, SAMUEL, ALLAN JAMES, BASS, RONALD MARSHALL, XIE, XUEYING, GINESTRA, JEAN CHARLES, KIM, DONG-SUB, COIT, WILLIAM GEORGE, MILLER, DAVID SCOTT, CARL, FREDERICK GORDON
Format: Patent
Sprache:eng
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Zusammenfassung:A heating system for a subsurface formation is described. The heating system includes a first heater, a second heater, and a third heater placed in an opening in the subsurface formation. Each heater includes: an electrical conductor; an insulation layer at least partially surrounding the electrical conductor; and an electrically conductive sheath at least partially surrounding the insulation layer. The electrical conductor is electrically coupled to the sheath at a lower end portion of the heater. The lower end portion is the portion of the heater distal from a surface of the opening. The first heater, the second heater, and the third heater are electrically coupled at the lower end portions of the heaters. The first heater, the second heater, and the third heater are configured to be electrically coupled in a three-phase wye configuration.