Fluidized bed CVD arrangement

The fluidized bed chemical vapor deposition arrangement comprises a furnace jacket, at least two reactors (12) inside the furnace jacket and insulation (20) in the furnace jacket around the reactors. The reactors comprise intake and exhaust lines (18). An independent claim is included for the method...

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Bibliographische Detailangaben
Hauptverfasser:	TOMLIN, BRUCE L, RICHARDSON, WILLIAM C, KEELEY, JOSEPH T, HALFINGER, JEFFREY A, NAGLEY, SCOTT G
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY NOZZLES PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The fluidized bed chemical vapor deposition arrangement comprises a furnace jacket, at least two reactors (12) inside the furnace jacket and insulation (20) in the furnace jacket around the reactors. The reactors comprise intake and exhaust lines (18). An independent claim is included for the method of scaling up a chemical vapor deposition process.