ROLLER WITH TREADING AND SYSTEM INCLUDING SAME

A method and apparatus for rotating wafers where a rotating roller (300, 400, 530, 531, 561, 562) imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller (300, 400, 530, 531, 561, 562) and wafer contact at their outer edges and the friction between...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: RYLE, LYNN, PAINO, PATRICK, JENSEN, ALAN, J, MERTKE, NORMAN, A, DYSON, WILLIAM, JR
Format: Patent
Sprache:eng ; fre
Schlagworte:
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