SILICA HEAT REFLECTION PLATE AND METHOD FOR MANUFACTURING SAME

The purpose of the present disclosure is to provide: a silica heat reflection plate which withstands use at temperatures up to 1,000°C, and which, in comparison to conventional silica heat reflection plates, maintains better adhesion between a silica plate and a reflector, is better at suppressing d...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MARUKO, Tomohiro, TAKAISHI, Yusuke, ISHIGURO, Yoshihiro
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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