A LITHOGRAPHIC APPARATUS AND INSPECTION SYSTEM WITH HYBRID FREE SPACE OPTICS AND PHOTONIC INTEGRATED CIRCUITS

A lithographic apparatus includes a projection system and an inspection system that includes a radiation system, a photonic integrated circuit system, and a detector system. The projection system projects an image of a patterning device onto a substrate. The radiation system directs radiation toward...

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Bibliographische Detailangaben
Hauptverfasser:	SAHIN, Ezgi, GOLDSTEIN, Michael, VAN T WESTEINDE, Maaike, JAHANI, Saman, VAN ENGELEN, Jorn, KOWALSKI, Jeffrey
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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