APPARATUSES AND METHODS TO CONTROL WAFER WARPAGE COMPENSATION ALONG X/Y DIRECTIONS

Provided are methods, apparatuses, and structure for mitigating wafer bow of a semiconductor wafer. Deposition of a backside layer stack may mitigate wafer bow that varies in orthogonal directions. Each of the backside layers may be deposited by a backside deposition apparatus. Therefore, they provi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG, Yanhui, SHAIKH, Fayaz A, CHAN, Michael Anthony, WANG, Ruisong
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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