PLURAL COMPONENT MATERIAL DISPENSING SYSTEM

PLURAL COMPONENT MATERIAL DISPENSING SYSTEM

A plural component system includes a first pump configured to pump a first constituent material to an applicator and a second pump configured to pump a second constituent material to the applicator. A controller is operatively connected to the first pump and the second pump to control operation of t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ROSS, Daniel, STREIT, Jeremy, LINDAHL, Austin, SPIESS, Andrew, INGEBRAND, John, SIERRA II, Augustine
Format: Patent
Sprache:eng ; fre
Schlagworte:
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
BLASTING
CONTROLLING
HEATING
LIGHTING
MECHANICAL ENGINEERING
NOZZLES
PERFORMING OPERATIONS
PHYSICS
POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS
PUMPS
PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
REGULATING
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
TRANSPORTING
WEAPONS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A plural component system includes a first pump configured to pump a first constituent material to an applicator and a second pump configured to pump a second constituent material to the applicator. A controller is operatively connected to the first pump and the second pump to control operation of the first pump and the second pump to pump the first and second constituent materials to the applicator at a desired ratio. Un système à plusieurs composants comprend une première pompe configurée pour pomper un premier matériau constitutif vers un applicateur et une seconde pompe configurée pour pomper un second matériau constitutif vers l'applicateur. Un dispositif de commande est relié de manière fonctionnelle à la première pompe et à la seconde pompe pour commander le fonctionnement de la première pompe et de la seconde pompe pour pomper les premier et second matériaux constitutifs vers l'applicateur à un taux souhaité.