PREPARING FEATURES ON A SUBSTRATE USING NANO-IMPRINT LITHOGRAPHY

In some examples, a method includes disposing a first hydrogel within a first recess of a substrate and over a pillar. The substrate may include a second recess in which the pillar is disposed, and a wall separating the first recess from the second recess. While the first hydrogel is disposed within...

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Bibliographische Detailangaben

Hauptverfasser:	MATHER, Brian, SARKAR, Krishnarjun, GEORGE, Wayne, XI, Weixian, FISHER, Jeffrey, HONG, Sahngki, WENNING, Brandon, KRAFT, Lewis
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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