SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

This substrate processing method includes: preparing a substrate having a first main surface and a second main surface on the opposite side to the first main surface, the first main surface having undulations; and subjecting the first main surface of the substrate to laser processing. The substrate...

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Bibliographische Detailangaben
Hauptverfasser: HAYAKAWA, Susumu, INOUE, Hideyuki
Format: Patent
Sprache:eng ; fre ; jpn
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