METAL MASK BASE MATERIAL, PRODUCTION METHOD FOR METAL MASK BASE MATERIAL, AND PRODUCTION METHOD FOR METAL MASK

This metal mask base material is constituted by an iron-nickel-based alloy. The metal mask base material exhibits a KAM value of not less than 2.18° as obtained by an electron backscatter diffraction method in which a step size is set to 0.5 μm and a crystal grain boundary is considered to be a boun...

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Bibliographische Detailangaben
1. Verfasser: HASHIMOTO Arifumi
Format: Patent
Sprache:eng ; fre ; jpn
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