FINE PATTERNING METHOD
The present invention relates to a fine patterning method, and more specifically, to a fine patterning method whereby a fine pattern area for pixels of an OLED display can be formed without a fine metal mask (FMM) via the division of processes into those performed in a non-vacuum state and those per...
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| Hauptverfasser: | , , , |
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| Format: | Patent |
| Sprache: | eng ; fre ; kor |
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