IMPRINT APPARATUS AND IMPRINT METHOD

Provided in the present invention are an imprint apparatus and an imprint method. The imprint apparatus comprises a mold, a resist application device and an imprint assembly, wherein the imprint assembly comprises an alignment adjusting device, a guide roller, a pressure roller and a translation rol...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHOU, Yang, CHEN, Linsen, FAN, Guangfei, LU, Guo, WEI, Guojun, MAO, Lihua, WEI, Zhongwen
Format:	Patent
Sprache:	chi ; eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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