IMPRINT APPARATUS AND IMPRINT METHOD

Provided in the present invention are an imprint apparatus and an imprint method. The imprint apparatus comprises a mold, a resist application device and an imprint assembly, wherein the imprint assembly comprises an alignment adjusting device, a guide roller, a pressure roller and a translation roller set. By moving the translation roller set, a film tape is tensioned on one side of the mold such that a first pattern on the mold is initially aligned with a second pattern on the film tape, and the relative positions of the mold and the film tape are then precisely adjusted by means of the alignment adjusting device, thus achieving precise alignment of the first pattern with the second pattern; then, the distance between the mold and the film tape is reduced such that the film tape, a resist layer and the first pattern come into contact, and the film tape is roll-pressed by using the pressure roller to achieve a tight fit between the film tape, the resist layer and the mold; and a film is removed by moving the