IMPURITY REDUCTION IN RADICAL TREATMENT CHAMBER

A method of post-deposition processing includes performing a preheat process in a radical treatment chamber, the preheat process comprising exposing a substrate having a metal layer formed thereon to purge gas and purging the purge gas at a pressure of between 400 Torr and 535 Torr, and performing a...

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Bibliographische Detailangaben
Hauptverfasser:	TRAN, Eric T, SHARMA, Shashank, RAMAKRISHNA, Mahesh, KAMP, Michael P, SAMPATH KUMAR, Pradeep, TAM, Norman L, CALDERON, Victor, IU, Dongming, RIESKE, Eric R, XIA, Edward T
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method of post-deposition processing includes performing a preheat process in a radical treatment chamber, the preheat process comprising exposing a substrate having a metal layer formed thereon to purge gas and purging the purge gas at a pressure of between 400 Torr and 535 Torr, and performing a radical treatment process in the radical treatment chamber, the radical treatment process comprising exposing the substrate to radical species. Un procédé de traitement post-dépôt comprend la réalisation d'un procédé de préchauffage dans une chambre de traitement radicalaire, le procédé de préchauffage comprenant l'exposition d'un substrat ayant une couche métallique formée sur celui-ci pour purger le gaz et la purge du gaz de purge à une pression comprise entre 400 Torr et 535 Torr, et la réalisation d'un procédé de traitement radicalaire dans la chambre de traitement radicalaire, le procédé de traitement radicalaire comprenant l'exposition du substrat à des espèces radicalaires.