BIAXIAL OPTICAL SENSOR SYSTEM

This disclosure pertains to biaxial optical sensor systems that may be used to evaluate variations in thickness and/or elevational changes about the circumference of an object, e.g., a semiconductor wafer, as the object is rotated about a rotational axis. Such sensor systems may feature a pair of li...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HIESTER, Jacob Lee, GALGINAITIS, Jason Gordon
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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