SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD FOR OBJECT TO BE PROCESSED, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE
The present invention addresses the problem of providing a semiconductor processing liquid which exhibits excellent metal corrosion resistance and excellent cleaning properties against an organic residue, upon contacting an object to be processed containing a metal which has been subjected to a chem...
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| creator | MIZUTANI Atsushi SHIGENOI Yuta |
| description | The present invention addresses the problem of providing a semiconductor processing liquid which exhibits excellent metal corrosion resistance and excellent cleaning properties against an organic residue, upon contacting an object to be processed containing a metal which has been subjected to a chemical-mechanical polishing process. A semiconductor processing liquid according to the present invention contains a compound represented by formula (1), and has a pH over 7.0.
La présente invention aborde le problème de fourniture d'un liquide de traitement de semi-conducteur qui présente une excellente résistance à la corrosion métallique et d'excellentes propriétés de nettoyage contre un résidu organique, lors de la mise en contact d'un objet à triater contenant un métal qui a été soumis à un processus de polissage chimico-mécanique. Un liquide de traitement de semi-conducteur selon la présente invention contient un composé représenté par la formule (1), et a un pH supérieur à 7,0.
化学機械研磨処理が施された金属を含む被処理物と接触させた際に、金属の防食性に優れ、かつ、有機残渣物に対する洗浄性にも優れる、半導体処理液の提供を課題とする。本発明の半導体処理液は、式（１）で表される化合物を含み、ｐＨが７．０超である。 |
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La présente invention aborde le problème de fourniture d'un liquide de traitement de semi-conducteur qui présente une excellente résistance à la corrosion métallique et d'excellentes propriétés de nettoyage contre un résidu organique, lors de la mise en contact d'un objet à triater contenant un métal qui a été soumis à un processus de polissage chimico-mécanique. Un liquide de traitement de semi-conducteur selon la présente invention contient un composé représenté par la formule (1), et a un pH supérieur à 7,0.
化学機械研磨処理が施された金属を含む被処理物と接触させた際に、金属の防食性に優れ、かつ、有機残渣物に対する洗浄性にも優れる、半導体処理液の提供を課題とする。本発明の半導体処理液は、式（１）で表される化合物を含み、ｐＨが７．０超である。</description><language>eng ; fre ; jpn</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240815&DB=EPODOC&CC=WO&NR=2024166627A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240815&DB=EPODOC&CC=WO&NR=2024166627A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIZUTANI Atsushi</creatorcontrib><creatorcontrib>SHIGENOI Yuta</creatorcontrib><title>SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD FOR OBJECT TO BE PROCESSED, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE</title><description>The present invention addresses the problem of providing a semiconductor processing liquid which exhibits excellent metal corrosion resistance and excellent cleaning properties against an organic residue, upon contacting an object to be processed containing a metal which has been subjected to a chemical-mechanical polishing process. A semiconductor processing liquid according to the present invention contains a compound represented by formula (1), and has a pH over 7.0.
La présente invention aborde le problème de fourniture d'un liquide de traitement de semi-conducteur qui présente une excellente résistance à la corrosion métallique et d'excellentes propriétés de nettoyage contre un résidu organique, lors de la mise en contact d'un objet à triater contenant un métal qui a été soumis à un processus de polissage chimico-mécanique. Un liquide de traitement de semi-conducteur selon la présente invention contient un composé représenté par la formule (1), et a un pH supérieur à 7,0.
化学機械研磨処理が施された金属を含む被処理物と接触させた際に、金属の防食性に優れ、かつ、有機残渣物に対する洗浄性にも優れる、半導体処理液の提供を課題とする。本発明の半導体処理液は、式（１）で表される化合物を含み、ｐＨが７．０超である。</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy7EKwjAUheEuDqK-wwVXBVslzunNrY20uTVNdCxF4iRaqKvvbgcFcXI6cPj-cfSsqdTIRnl0bKGyjFTX2uyg0Aev1eL7KsnlrCAbIKd7QgeOIaUPoUFLo6CUxmcSnbc_ERVDY9loBEVHjTSNRpf22ofZeyfRPCOH-TJ09yb0XXsOt_BoTpyskk0shEi2Ml7_p16_FzxN</recordid><startdate>20240815</startdate><enddate>20240815</enddate><creator>MIZUTANI Atsushi</creator><creator>SHIGENOI Yuta</creator><scope>EVB</scope></search><sort><creationdate>20240815</creationdate><title>SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD FOR OBJECT TO BE PROCESSED, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE</title><author>MIZUTANI Atsushi ; SHIGENOI Yuta</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2024166627A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; jpn</language><creationdate>2024</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIZUTANI Atsushi</creatorcontrib><creatorcontrib>SHIGENOI Yuta</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIZUTANI Atsushi</au><au>SHIGENOI Yuta</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD FOR OBJECT TO BE PROCESSED, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE</title><date>2024-08-15</date><risdate>2024</risdate><abstract>The present invention addresses the problem of providing a semiconductor processing liquid which exhibits excellent metal corrosion resistance and excellent cleaning properties against an organic residue, upon contacting an object to be processed containing a metal which has been subjected to a chemical-mechanical polishing process. A semiconductor processing liquid according to the present invention contains a compound represented by formula (1), and has a pH over 7.0.
La présente invention aborde le problème de fourniture d'un liquide de traitement de semi-conducteur qui présente une excellente résistance à la corrosion métallique et d'excellentes propriétés de nettoyage contre un résidu organique, lors de la mise en contact d'un objet à triater contenant un métal qui a été soumis à un processus de polissage chimico-mécanique. Un liquide de traitement de semi-conducteur selon la présente invention contient un composé représenté par la formule (1), et a un pH supérieur à 7,0.
化学機械研磨処理が施された金属を含む被処理物と接触させた際に、金属の防食性に優れ、かつ、有機残渣物に対する洗浄性にも優れる、半導体処理液の提供を課題とする。本発明の半導体処理液は、式（１）で表される化合物を含み、ｐＨが７．０超である。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD FOR OBJECT TO BE PROCESSED, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE |
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