POLISHING SLURRY COMPOSITION

The present invention relates to a polishing slurry composition comprising: polishing particles; a polishing inhibitor; and a surface roughness improver, wherein the surface roughness improver comprises a cationic quaternary ammonium salt polymer. The composition has an excellent surface-roughness i...

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Bibliographische Detailangaben
Hauptverfasser:	KONG, Hyun Goo, LIM, Se Jin, HWANG, Jin Sook, KIM, Yun Su
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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