POLISHING SLURRY COMPOSITION

The present invention relates to a polishing slurry composition comprising: polishing particles; a polishing inhibitor; and a surface roughness improver, wherein the surface roughness improver comprises a cationic quaternary ammonium salt polymer. The composition has an excellent surface-roughness i...

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Bibliographische Detailangaben
Hauptverfasser:	KONG, Hyun Goo, LIM, Se Jin, HWANG, Jin Sook, KIM, Yun Su
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	The present invention relates to a polishing slurry composition comprising: polishing particles; a polishing inhibitor; and a surface roughness improver, wherein the surface roughness improver comprises a cationic quaternary ammonium salt polymer. The composition has an excellent surface-roughness improvement effect during polishing. La présente invention concerne une composition de bouillie de polissage comprenant : des particules de polissage ; un inhibiteur de polissage ; et un agent d'amélioration de la rugosité de surface, l'agent d'amélioration de la rugosité de surface comprenant un polymère de sel d'ammonium quaternaire cationique. La composition présente un excellent effet d'amélioration de la rugosité de surface pendant le polissage. 본 발명은 연마입자; 연마억제제; 및 표면거칠기 개선제;를 포함하고, 상기 표면거칠기 개선제는, 양이온성 4가 암모늄염 중합체를 포함하는 것인, 연마 슬러리 조성물에 관한 것이다. 상기 조성물은 연마 시 표면 거칠기 개선 효과가 우수한 효과가 있다.