ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE

To provide an electronic device manufacturing aqueous solution capable of suppressing defects. To provide an electronic device manufacturing aqueous solution comprising a sulfonic acid derivative (A) having a certain structure, a solvent (B) comprising water and a hydroxy derivative (C) having a cer...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO, Kazuma, YANAGITA, Hiroshi
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To provide an electronic device manufacturing aqueous solution capable of suppressing defects. To provide an electronic device manufacturing aqueous solution comprising a sulfonic acid derivative (A) having a certain structure, a solvent (B) comprising water and a hydroxy derivative (C) having a certain structure. L'invention vise à fournir une solution aqueuse de fabrication de dispositif électronique capable de supprimer des défauts. L'invention vise à fournir une solution aqueuse de fabrication de dispositif électronique comprenant un dérivé d'acide sulfonique (A) ayant une certaine structure, un solvant (B) comprenant de l'eau et un dérivé d'hydroxy (C) ayant une certaine structure.