RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE

The present invention provides: a resin composition for an anti-reflection film, the resin composition comprising hollow aluminosilicate particles, amorphous silica particles, a first binder resin having a thermosetting functional group, and a solvent, wherein the hollow aluminosilicate particles ha...

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Bibliographische Detailangaben
Hauptverfasser:	AHN, Boeun, KIM, Jeongsik, NAMGOONG, Jinwoong
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	The present invention provides: a resin composition for an anti-reflection film, the resin composition comprising hollow aluminosilicate particles, amorphous silica particles, a first binder resin having a thermosetting functional group, and a solvent, wherein the hollow aluminosilicate particles have a Si/Al molar ratio of 7 to 15; an anti-reflection film formed therefrom; and a solid-state imaging device including the anti-reflection film. When the resin composition for an anti-reflection film according to the present invention is used to form a coating film, the formation of cracks is suppressed, the coating film has excellent flatness, moisture absorption under high temperature and high humidity is prevented, and penetration by a developer solution and stripping solution can be prevented. La présente invention concerne : une composition de résine pour un film antireflet, la composition de résine comprenant des particules creuses d'aluminosilicate, des particules de silice amorphe, une première résine liante ayant un groupe fonctionnel thermodurcissable, et un solvant, les particules creuses d'aluminosilicate ayant un rapport molaire Si/Al de 7 à 15 ; un film antireflet formé à partir de celle-ci ; et un dispositif d'imagerie à semi-conducteurs comprenant le film antireflet. Lorsque la composition de résine pour un film antireflet selon la présente invention est utilisée pour former un film de revêtement, la formation de fissures est supprimée, le film de revêtement a une excellente planéité, une absorption d'humidité à haute température et à humidité élevée est empêchée, et la pénétration par une solution de révélateur et une solution de décapage peut être empêchée. 본 발명은 중공형 알루미노실리케이트 입자, 무정형 실리카 입자, 열경화성 작용기를 갖는 제1 결합제 수지 및 용제를 포함하고, 상기 중공형 알루미노실리케이트 입자는 Si/Al 몰비가 7 내지 15인 반사방지막용 수지 조성물, 이로부터 형성된 반사방지막 및 상기 반사방지막을 포함하는 고체 촬상 소자를 제공한다. 본 발명에 따른 반사방지막용 수지 조성물은 도막 형성시 크랙 발생이 억제되고, 도막의 평탄성이 우수하며, 고온 고습 하에서의 수분 흡착이 방지되고, 현상액 및 박리액에 의한 투습을 막을 수 있다.