SUBSTRATE CONTAINER WITH PURGE GAS DIFFUSER

Described are wafer containers adapted to store or transport semiconductor wafers in a clean environment, including containers that include a purge gas delivery device, as well as methods for purging the environment within the container. In one aspect, the invention relates to a diffuser that includes: an elongate body comprising an upper end, a lower end, a front wall, a rear wall, sidewalls, a height between the upper end and the lower end, a width between the sidewalls, and a channel; a diffuser inlet that allows flow of gas into the channel; a diffuser outlet that comprises one or more openings in the front wall, the sidewalls, or both; non-porous channel surfaces comprising a non-porous rear wall surface and non-porous sidewall surfaces; and a flow control structure within the channel that directs flow of gas along a length of the channel between the diffuser inlet and the diffuser outlet. L'invention concerne des récipients de tranches conçus pour stocker ou transporter des tranches de semi-conducteur dans un environnement propre, y compris des récipients qui comprennent un dispositif de distribution de gaz de purge, ainsi que des procédés pour purger l'environnement à l'intérieur du récipient.