A MIXTURE FOR PROCESSING A BODY OF POLYCRYSTALLINE DIAMOND MATERIAL

An acid leaching mixture for removing residual solvent catalyst material from a body of polycrystalline diamond (PCD) material having a non-diamond phase including the solvent catalyst material, has a molar concentration of between around 4M to around 9M and includes hydrofluoric (HF) acid, any one...

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Bibliographische Detailangaben
Hauptverfasser:	ZVORISTE-WALTERS, Carmen Elena, ALDMINGTON, David William
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL EARTH DRILLING EARTH DRILLING, e.g. DEEP DRILLING FERROUS OR NON-FERROUS ALLOYS FIXED CONSTRUCTIONS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MINING MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR ASLURRY OF MINERALS FROM WELLS PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	An acid leaching mixture for removing residual solvent catalyst material from a body of polycrystalline diamond (PCD) material having a non-diamond phase including the solvent catalyst material, has a molar concentration of between around 4M to around 9M and includes hydrofluoric (HF) acid, any one or more of hydrochloric (HCl) acid, nitric (HNO3) acid, sulfuric (H2SO4) acid, and/or phosphoric (H3PO4) acid and water. Un mélange de lixiviation acide destiné à éliminer un matériau catalyseur de solvant résiduel d'un corps de matériau diamant polycristallin (PCD) ayant une phase non diamant comprenant le matériau catalyseur de solvant a une concentration molaire comprise entre environ 4 M et environ 9 M et comprend de l'acide fluorhydrique (HF), l'un quelconque ou plusieurs éléments parmi de l'acide chlorhydrique (HCl), de l'acide nitrique (HNO3), de l'acide sulfurique (H2SO4) et/ou de l'acide phosphorique (H3PO4), ainsi que de l'eau.