METHOD AND DEVICE FOR MASK INSPECTION

The invention relates to a method and a device for mask inspection, wherein the mask is designed for operation in reflection at an operating wavelength of less than 30 nm and is intended to be illuminated in a lithography process in a projection exposure apparatus for exposing a wafer. In a method a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MATEJKA, Ulrich, BREKERBOHM, Lutz
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!