APPARATUS AND METHOD FOR MEASURING MELTING POINT OF ULTRAHIGH-TEMPERATURE MATERIAL

An apparatus and method for measuring a melting point of an ultrahigh-temperature material. The apparatus for measuring the melting point of the ultrahigh-temperature material comprises: a closed measurement chamber (10), a sample stage (20) provided in the measurement chamber (10) and used for plac...

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Hauptverfasser: CHEN, Mingzhou, LIAO, Yehong, LI, Rui, FENG, Qijie, YAO, Jian, CHEN, Mengteng, ZHANG, Xiansheng, REN, Qisen, ZHOU, Wei, YAN, Yan, SUN, Jiliang, TANG, Bin, GE, Hongen, GUO, Daxi
Format: Patent
Sprache:chi ; eng ; fre
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Zusammenfassung:An apparatus and method for measuring a melting point of an ultrahigh-temperature material. The apparatus for measuring the melting point of the ultrahigh-temperature material comprises: a closed measurement chamber (10), a sample stage (20) provided in the measurement chamber (10) and used for placing a sample (100) to be measured, a plasma system connected to at least one side of the measurement chamber (10) and used for generating a plasma jet as a heat source to heat said sample (100), and a non-contact temperature measurement unit used for measuring the temperature of said sample (100); wherein the measurement chamber (10) is provided with at least one temperature measurement window (11) corresponding to the non-contact temperature measurement unit, and at least one observation window (12) for photographing and recording. According to the apparatus, said sample (100) whose melting point is to be measured is heated by means of plasma heating, so that said sample (100) can be melted by means of surface hea