DESIGN LAYOUT-BASED SCANNING ELECTRON MICROSCOPE IMAGE DEFECT CLASSIFICATION METHOD AND APPARATUS

The present application provides a design layout-based scanning electron microscope image defect classification method and apparatus, an electronic device, and a computer readable storage medium. The method comprises: acquiring a scanning electron microscope image; acquiring defect information of th...

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Bibliographische Detailangaben
Hauptverfasser: HAN, Chunying, YAN, Changlian
Format: Patent
Sprache:chi ; eng ; fre
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Zusammenfassung:The present application provides a design layout-based scanning electron microscope image defect classification method and apparatus, an electronic device, and a computer readable storage medium. The method comprises: acquiring a scanning electron microscope image; acquiring defect information of the scanning electron microscope image by using a defect identification method on the basis of the scanning electron microscope image, wherein the defect information comprises at least one of defect position information, defect peripheral pattern grouping information, and defect position layout lower and upper layer connection relationship information; and classifying defects on the basis of the defect information. The present application can effectively improve the accuracy of defect classification. La présente demande concerne un procédé et un appareil de classification de défaut d'image de microscope électronique à balayage sur la base d'une disposition de conception, ainsi qu'un dispositif électronique et un supp