INTRAMOLECULAR STABILIZED GROUP 13 METAL COMPLEXES WITH IMPROVED THERMAL STABILITY FOR VAPOR PHASE THIN-FILM DEPOSITION TECHNIQUES

The disclosed and claimed subject matter provides Group 13 (i.e., B, Al, Ga and In) compounds and methods of using the compounds as precursors for deposition of metal-containing films. La divulgation concerne des composés du groupe 13 (c'est-à-dire, le B, l'Al, le Ga et l'In) et des p...

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Bibliographische Detailangaben
Hauptverfasser:	IVANOV, Sergei, MAI, Lukas, HEIL, Holger, MATURI, Mark, MEHLMANN, Paul
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The disclosed and claimed subject matter provides Group 13 (i.e., B, Al, Ga and In) compounds and methods of using the compounds as precursors for deposition of metal-containing films. La divulgation concerne des composés du groupe 13 (c'est-à-dire, le B, l'Al, le Ga et l'In) et des procédés d'utilisation des composés en tant que précurseurs pour le dépôt de films contenant du métal.