PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY

Processing chambers including at least one gas reservoir connected to and in fluid communication with the lid through a fast-switching valve and a gas reservoir line are described. Processing methods, for example, etching methods, using the processing chambers are also described. L'invention co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HSU, Chih-Hsun, LU, Jiang, OR, David T, ZHANG, Le, XIA, Borui, YUAN, Xiaoxiong
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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