PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY

PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY

Processing chambers including at least one gas reservoir connected to and in fluid communication with the lid through a fast-switching valve and a gas reservoir line are described. Processing methods, for example, etching methods, using the processing chambers are also described. L'invention co...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HSU, Chih-Hsun, LU, Jiang, OR, David T, ZHANG, Le, XIA, Borui, YUAN, Xiaoxiong
Format: Patent
Sprache:eng ; fre
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Processing chambers including at least one gas reservoir connected to and in fluid communication with the lid through a fast-switching valve and a gas reservoir line are described. Processing methods, for example, etching methods, using the processing chambers are also described. L'invention concerne des chambres de traitement comprenant au moins un réservoir de gaz relié au couvercle et en communication fluidique avec celui-ci par l'intermédiaire d'une soupape de commutation rapide et d'une ligne de réservoir de gaz. L'invention concerne également des procédés de traitement, par exemple, des procédés de gravure, utilisant les chambres de traitement.