PROTECTION OF SENSITIVE SURFACES IN SEMICONDUCTOR PROCESSING

Methods and apparatus for transient protection of a sensitive surface of a substrate are described. Methods that facilitate transient protection of a sensitive surface of substrate include depositing a sacrificial capping layer on a sensitive surface of the substrate after a processing operation. Th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BROGAN, Lee J, HYMES, Diane, CHEN, Zhengtao, PHILLIPS, Oluwadamilola Sanyaolu, HENRI, Jon
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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