ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD

The present invention addresses the problem of providing an actinic ray-sensitive or radiation-sensitive resin composition from which a resist pattern having a small LWR can be formed. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention comprises: a r...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKAKI Asahi, MARUMO Kazuhiro, TANGO Naohiro
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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