SCANNING ELECTRON MICROSCOPE IMAGE DEFECT DETECTION METHOD AND APPARATUS BASED ON DESIGN LAYOUT

A scanning electron microscope image defect detection method, apparatus and device based on design layout, and a computer-readable storage medium. The method comprises: obtaining a first scanning electron microscope image of a position to be detected, and a second scanning electron microscope image...

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Bibliographische Detailangaben
1. Verfasser: YAN, Changlian
Format: Patent
Sprache:chi ; eng ; fre
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Zusammenfassung:A scanning electron microscope image defect detection method, apparatus and device based on design layout, and a computer-readable storage medium. The method comprises: obtaining a first scanning electron microscope image of a position to be detected, and a second scanning electron microscope image of a position other than the position to be detected (S201); enabling the first scanning electron microscope image and the second scanning electron microscope image to respectively align with a design layout of the position to be detected to obtain alignment results (S202); on the basis of the alignment results, respectively comparing the first scanning electron microscope image and the second scanning electron microscope image with the design layout of the position to be detected to obtain difference information (S203); and according to the difference information and a formula file, determining whether a first difference between the first scanning electron microscope image and the design layout is a defect (S204).