FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITION CHAMBER

Embodiments disclosed herein include a method of monitoring a photoresist deposition process. In an embodiment, the method comprises depositing a photoresist layer to a first thickness over a substrate, measuring a property of the photoresist layer with a first electromagnetic (EM) radiation source,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SACHAN, Madhur, WORKU, Bekele, CHAN, Kelvin, HAO, Ruiying, EGAN, Todd, BUDIARTO, Edward, BOZANO, Luisa, DE CECCO, Paola, FREED, Regina
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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