CLEANING COMPOSITIONS

This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods. La présente invention concerne des compositions pour le nettoyage de résidus post-gravure sur un substrat semi-conducteur, ainsi que des procédés de nettoyage...

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Hauptverfasser: JIAO, Jieying, DORY, Thomas
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creator JIAO, Jieying
DORY, Thomas
description This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods. La présente invention concerne des compositions pour le nettoyage de résidus post-gravure sur un substrat semi-conducteur, ainsi que des procédés de nettoyage associés.
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subjects ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
CINEMATOGRAPHY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FATTY ACIDS THEREFROM
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
title CLEANING COMPOSITIONS
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