CLEANING COMPOSITIONS

This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods. La présente invention concerne des compositions pour le nettoyage de résidus post-gravure sur un substrat semi-conducteur, ainsi que des procédés de nettoyage...

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Bibliographische Detailangaben
Hauptverfasser:	JIAO, Jieying, DORY, Thomas
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods. La présente invention concerne des compositions pour le nettoyage de résidus post-gravure sur un substrat semi-conducteur, ainsi que des procédés de nettoyage associés.