MEMBER FOR SEMICONDUCTOR-MANUFACTURING DEVICE

In the present invention, a wafer placement table 10 comprises a gas outflow passage 56, a gas common passage 54, and a gas inflow passage 52. The gas outflow passage 56 is open to a wafer placement surface 21, and a plurality of gas outflow passages are provided to the wafer placement table 10. The...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WAKI Jyunya, TAKEBAYASHI Hiroshi, KOJIMA Mitsuru
Format: Patent
Sprache:eng ; fre ; jpn
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