ATOMIC LAYER DEPOSITION DEVICE

The present invention relates to an atomic layer deposition device, wherein a reaction chamber comprises a reaction chamber main body and a cavity door, a reaction cavity is formed inside the reaction chamber main body, an air inlet and an air extraction opening are provided in the reaction chamber main body, and the cavity door is detachably connected to the reaction chamber main body; a mounting frame is fixedly connected to the cavity door, and when the cavity door is connected to the reaction chamber main body, the mounting frame is located inside the reaction cavity; a first bearing member is configured to bear a block-shaped object to be coated, and the first bearing member is detachably connected to the mounting frame; a second bearing member is configured to bear a powdery object to be coated, and the second bearing member is detachably connected to the mounting frame; in a first use state, the first bearing member is fixedly connected to the mounting frame; and in a second use state, the second beari