DIMENSIONAL METROLOGY USING NON-LINEAR OPTICS
Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device. L'invention concerne des systèmes et des p...
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| creator | ADLER, David L |
| description | Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device.
L'invention concerne des systèmes et des procédés pour utiliser la génération de seconde harmonique de lumière pour surveiller le processus de fabrication quant à des changements qui peuvent affecter la performance ou le rendement de dispositifs produits et/ou déterminer des dimensions critiques du dispositif produit. |
| format | Patent |
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L'invention concerne des systèmes et des procédés pour utiliser la génération de seconde harmonique de lumière pour surveiller le processus de fabrication quant à des changements qui peuvent affecter la performance ou le rendement de dispositifs produits et/ou déterminer des dimensions critiques du dispositif produit.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB18fR19Qv29Pdz9FHwdQ0J8vfxd49UCA329HNX8PP30_Xx9HN1DFLwDwjxdA7mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBkbGRiamBoaWjobGxKkCAHISJpw</recordid><startdate>20231221</startdate><enddate>20231221</enddate><creator>ADLER, David L</creator><scope>EVB</scope></search><sort><creationdate>20231221</creationdate><title>DIMENSIONAL METROLOGY USING NON-LINEAR OPTICS</title><author>ADLER, David L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023245019A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ADLER, David L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ADLER, David L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DIMENSIONAL METROLOGY USING NON-LINEAR OPTICS</title><date>2023-12-21</date><risdate>2023</risdate><abstract>Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device.
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| language | eng ; fre |
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| subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
| title | DIMENSIONAL METROLOGY USING NON-LINEAR OPTICS |
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