DIMENSIONAL METROLOGY USING NON-LINEAR OPTICS

Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device. L'invention concerne des systèmes et des p...

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Bibliographische Detailangaben
1. Verfasser:	ADLER, David L
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device. L'invention concerne des systèmes et des procédés pour utiliser la génération de seconde harmonique de lumière pour surveiller le processus de fabrication quant à des changements qui peuvent affecter la performance ou le rendement de dispositifs produits et/ou déterminer des dimensions critiques du dispositif produit.