VIRTUAL SHUTTER IN ION BEAM SYSTEM

The present disclosure provides a method of processing a substrate 30 within an ion beam system 10. The substrate has a top surface that has a plurality of features, an edge and a bottom surface. The substrate is placed on a wafer stage 20 and an energetic particle beam 40;42 having a radial flux di...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HEGDE, Sarpangala, HSIAO, Wei-hua, BAUR, Armin, WESTERMAN, Russell
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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