SECOND HARMONIC-BASED METHOD AND APPARATUS FOR MEASURING SEMICONDUCTOR MULTILAYER STRUCTURE

The present invention provides a second harmonic-based method and apparatus for global measurement of wafers. The solution comprises three approaches, i.e., fixed-point measurement, scanning measurement, and a combination of fixed-point measurement and scanning measurement. According to the solution...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG, Chongji, ZHOU, Puxi, ZHAO, Weiwei
Format:	Patent
Sprache:	chi ; eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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