SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Provided is a substrate processing device for processing a substrate, the substrate processing device comprising: a substrate holding portion having a holding surface for the substrate; a rotating mechanism for rotating the substrate on the holding surface centered on the axis of rotation of the sub...

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Bibliographische Detailangaben
Hauptverfasser: YAMASHITA, Yohei, YAMAWAKI, Yohei
Format: Patent
Sprache:eng ; fre ; jpn
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