SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Provided is a substrate processing device for processing a substrate, the substrate processing device comprising: a substrate holding portion having a holding surface for the substrate; a rotating mechanism for rotating the substrate on the holding surface centered on the axis of rotation of the sub...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!