COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER

A plasma doping system including a plasma doping chamber, a platen mounted in the plasma doping chamber for supporting a workpiece, a source of ionizable gas coupled to the chamber, the ionizable gas containing a desired dopant for implantation into the workpiece, a plasma source for producing a pla...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BHOSLE, Vikram M, TYE, Jordan B, LEAVITT, Christopher J, MILLER, Timothy J, HERMANSON, Eric D
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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