VACUUM PROCESSING DEVICE

A vacuum processing device according to the present invention comprises: a chamber having an upper wall in which a first opening and a second opening are formed; an upper lid which opens/closes the first opening; a hinge mechanism which is provided to cover the second opening and pivotally supports...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	OOISHI Tetsuya, TSUKAMOTO Norihito, YOKOYAMA Shuichi, IKENAGA Hidetaka, YASUMATSU Yasushi, TAKEYAMA Terushige, KOUNO Toshimitsu, KICHIKAWA Tomohiro, TAMURA Naoki, KISHI Iori
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CYLINDERS DIFFUSION TREATMENT OF METALLIC MATERIAL ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PISTONS SEALINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS THERMAL INSULATION IN GENERAL TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	A vacuum processing device according to the present invention comprises: a chamber having an upper wall in which a first opening and a second opening are formed; an upper lid which opens/closes the first opening; a hinge mechanism which is provided to cover the second opening and pivotally supports the upper lid with respect to the first opening; a first sealing member which is provided between the upper lid and the upper wall so as to surround the first opening and elastically deforms; and a second sealing member which is provided between the hinge mechanism and the upper wall so as to surround the second opening and elastically deforms. La présente invention concerne un dispositif de traitement sous vide comprenant : une chambre comportant une paroi supérieure dans laquelle une première ouverture et une seconde ouverture sont formées ; un couvercle supérieur destiné à ouvrir/fermer la première ouverture ; un mécanisme de charnière disposé de façon à recouvrir la seconde ouverture et portant pivotant le couvercle supérieur par rapport à la première ouverture ; un premier élément d'étanchéité disposé entre le couvercle supérieur et la paroi supérieure de façon à entourer la première ouverture, et se déformant élastiquement ; et un second élément d'étanchéité disposé entre le mécanisme de charnière et la paroi supérieure de façon à entourer la seconde ouverture, et se déformant élastiquement. 本発明に係る真空処理装置は、第１開口部及び第２開口部が形成された上壁を有するチャンバーと、前記第１開口部を開閉する上蓋と、前記第２開口部を覆うように設けられ、前記第１開口部に対して前記上蓋を回動可能に支持するヒンジ機構と、前記第１開口部を囲むように前記上蓋と前記上壁との間に設けられ、弾性変形する第１封止部材と、前記第２開口部を囲むように前記ヒンジ機構と前記上壁との間に設けられ、弾性変形する第２封止部材と、を備える。