MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE

MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE

The invention relates to a multi-beam particle microscope for reducing particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced by the use of a specific objective lens cable and/or a specific sample stage...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DISTERHEFT, David, STORECK, Gero, KIEREY, Holger
Format: Patent
Sprache:eng ; fre
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator DISTERHEFT, David
STORECK, Gero
KIEREY, Holger
description The invention relates to a multi-beam particle microscope for reducing particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced by the use of a specific objective lens cable and/or a specific sample stage cable, which are specifically shielded. L'invention concerne un microscope à particules à faisceaux multiples permettent de réduire les traces induites par un faisceau de particules sur un échantillon auquel est appliquée une haute tension. L'apparition d'un gaz résiduel supplémentaire dans la chambre d'échantillon est réduite par l'utilisation d'un câble de lentille d'objectif spécifique et/ou d'un câble d'étage d'échantillon spécifique, qui sont spécifiquement blindés.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2023160874A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2023160874A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2023160874A13</originalsourceid><addsrcrecordid>eNrjZAjxDfUJ8dR1cnX0VQhwDArxdPZxVfD1dA7yD3b2D3BVcPMPUghydQl19vRzRygAKdf19AMKu7oohAQ5OrsGK_j7KTgqBDv6Bvi48jCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-HB_IwMjY0MzAwtzE0dDY-JUAQDHvjCu</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE</title><source>esp@cenet</source><creator>DISTERHEFT, David ; STORECK, Gero ; KIEREY, Holger</creator><creatorcontrib>DISTERHEFT, David ; STORECK, Gero ; KIEREY, Holger</creatorcontrib><description>The invention relates to a multi-beam particle microscope for reducing particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced by the use of a specific objective lens cable and/or a specific sample stage cable, which are specifically shielded. L'invention concerne un microscope à particules à faisceaux multiples permettent de réduire les traces induites par un faisceau de particules sur un échantillon auquel est appliquée une haute tension. L'apparition d'un gaz résiduel supplémentaire dans la chambre d'échantillon est réduite par l'utilisation d'un câble de lentille d'objectif spécifique et/ou d'un câble d'étage d'échantillon spécifique, qui sont spécifiquement blindés.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230831&amp;DB=EPODOC&amp;CC=WO&amp;NR=2023160874A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230831&amp;DB=EPODOC&amp;CC=WO&amp;NR=2023160874A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DISTERHEFT, David</creatorcontrib><creatorcontrib>STORECK, Gero</creatorcontrib><creatorcontrib>KIEREY, Holger</creatorcontrib><title>MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE</title><description>The invention relates to a multi-beam particle microscope for reducing particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced by the use of a specific objective lens cable and/or a specific sample stage cable, which are specifically shielded. L'invention concerne un microscope à particules à faisceaux multiples permettent de réduire les traces induites par un faisceau de particules sur un échantillon auquel est appliquée une haute tension. L'apparition d'un gaz résiduel supplémentaire dans la chambre d'échantillon est réduite par l'utilisation d'un câble de lentille d'objectif spécifique et/ou d'un câble d'étage d'échantillon spécifique, qui sont spécifiquement blindés.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAjxDfUJ8dR1cnX0VQhwDArxdPZxVfD1dA7yD3b2D3BVcPMPUghydQl19vRzRygAKdf19AMKu7oohAQ5OrsGK_j7KTgqBDv6Bvi48jCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-HB_IwMjY0MzAwtzE0dDY-JUAQDHvjCu</recordid><startdate>20230831</startdate><enddate>20230831</enddate><creator>DISTERHEFT, David</creator><creator>STORECK, Gero</creator><creator>KIEREY, Holger</creator><scope>EVB</scope></search><sort><creationdate>20230831</creationdate><title>MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE</title><author>DISTERHEFT, David ; STORECK, Gero ; KIEREY, Holger</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023160874A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>DISTERHEFT, David</creatorcontrib><creatorcontrib>STORECK, Gero</creatorcontrib><creatorcontrib>KIEREY, Holger</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DISTERHEFT, David</au><au>STORECK, Gero</au><au>KIEREY, Holger</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE</title><date>2023-08-31</date><risdate>2023</risdate><abstract>The invention relates to a multi-beam particle microscope for reducing particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced by the use of a specific objective lens cable and/or a specific sample stage cable, which are specifically shielded. L'invention concerne un microscope à particules à faisceaux multiples permettent de réduire les traces induites par un faisceau de particules sur un échantillon auquel est appliquée une haute tension. L'apparition d'un gaz résiduel supplémentaire dans la chambre d'échantillon est réduite par l'utilisation d'un câble de lentille d'objectif spécifique et/ou d'un câble d'étage d'échantillon spécifique, qui sont spécifiquement blindés.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre
recordid cdi_epo_espacenet_WO2023160874A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T00%3A12%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DISTERHEFT,%20David&rft.date=2023-08-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2023160874A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true