METHOD FOR FORMATION OF INSULATION FILM PATTERN, PRECURSOR USED FOR PATTERN FORMATION, AND SEMICONDUCTOR DEVICE

The present invention provides a method for formation of an insulation film pattern, the method comprising the steps of: providing a substrate including two or more different types of dielectric film regions; selectively forming a blocking film on the substrate to include a first region where a bloc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUN, Ha Kyung, WEO, So Jeong, KIM, Pil Soo, KIM, Jun Young, SIM, Jang Keun, LEE, Han jin, LEE, Jae Woo, BOK, Cheoi Kyu
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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