COATING APPARATUS AND COATING METHOD

Provided is a coating apparatus with which it is possible to suppress formation of unevenness in coating and form a coating film having a uniform thickness even in the case when foreign matter is present between a stage and a substrate. Specifically, the coating apparatus comprises: a stage on which...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAMAKAWA, Kenji, HORIUCHI, Nobuo
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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