COMPONENT PREPARATION METHOD AND PLASMA PROCESSING APPARATUS

The embodiments of the present application relate to the technical field of plasma processing. Provided are a component preparation method and a plasma processing apparatus, which are used for solving the problem of how to improve the durability of a component in a plasma processing apparatus. The plasma processing apparatus comprises a chamber for executing plasma processing, and a component having at least a portion of the structure thereof exposed in the chamber. The component comprises a substrate, a first connecting layer, which covers an outer surface of the substrate, and a first protective layer, which covers an outer surface of the first connecting layer. The material of the substrate comprises a first metal ion; the material of the first connecting layer comprises a first functional group, which has the function of being bonded to a metal ion; and the material of the first protective layer comprises a first metal oxide, which comprises a second metal ion, wherein the first functional group is respec