APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED SURFACE OF A MIRROR MODULE, PROJECTION SYSTEM, ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS

Mirror module (100, 300, 400) for a projection exposure apparatus (200), comprising an optical used surface (104, 303, 403), an optical measurement surface (106, 305, 405, 405´), a measurement apparatus (113, 309, 409, 409´) for ascertaining the degradation state of the measurement surface, characte...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	STORM, Arnoldus Jan, KALLER, Julian, BECKER, Moritz
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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